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XRD measurement of thermal strain in InSb-based devices

Identifieur interne : 006D58 ( Main/Repository ); précédent : 006D57; suivant : 006D59

XRD measurement of thermal strain in InSb-based devices

Auteurs : RBID : Pascal:07-0365808

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English descriptors

Abstract

The low temperature-induced strain in the thin brittle InSb upper part of ready-to-work InSb-based infrared photo-detectors (Hybrid Focal Plane Arrays (HFPA) technology) has been measured using X-ray diffraction (XRD). Assuming no shear component and no surface normal stress in the InSb upper part of the device and using linear elasticity laws lead to simple strain-stress relations. It was shown that the maximum value of the thermal stress in the InSb part of the studied samples is well under the value of the yield stress of InSb at the working temperature of the devices.

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Pascal:07-0365808

Le document en format XML

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<div type="abstract" xml:lang="en">The low temperature-induced strain in the thin brittle InSb upper part of ready-to-work InSb-based infrared photo-detectors (Hybrid Focal Plane Arrays (HFPA) technology) has been measured using X-ray diffraction (XRD). Assuming no shear component and no surface normal stress in the InSb upper part of the device and using linear elasticity laws lead to simple strain-stress relations. It was shown that the maximum value of the thermal stress in the InSb part of the studied samples is well under the value of the yield stress of InSb at the working temperature of the devices.</div>
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